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材料簡介
Introduction
氣熔石英材料
氣泡少,具有良好的透明度和幾何尺寸。廣泛應用于半導體、光纖、太陽能光伏、光學鍍膜等領域。
The material has few bubble in it with excellent transparency and geometric dimension .They are widely used for semiconductor,Optical Fiber, Solar Energy Photovoltaics, Optical Coating/Filming.
氣熔高純少氣泡石英材料
氣熔高純少氣泡石英材料,具有氣泡少、純度高,幾乎無包裹物、耐高溫性能等特性,廣泛的應用于半導體先進制程、光學、化學加工、紫外線和高溫窗口等。
Thanks to the few bubbles, high purity, almost no inclusion, high temperature resistant performance and other characteristics,FLH321HS has been widely used in semiconductor advanced manufacturing, optical, chemical processing, UV and high temperature window.
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