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FLH321HS材料，具有氣泡少、純度高，幾乎無包裹物、耐高溫性能等特性，
廣泛的應(yīng)用于半導(dǎo)體先進制程、光學(xué)、化學(xué)加工、紫外線和高溫窗口等。

Thanks to the few bubbles, high purity, almost no inclusion,
high temperature resistant performance and other characteristics,
FLH321HS has been widely used in semiconductor advanced manufacturing,
optical, chemical processing, UV and high temperature window.